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光刻

na.【物】photoetching
网络Lithography; photolithography; photoengraving

光刻

英-汉网络释义

光刻

na.

1.【物】photoetching

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A small undesired hole in an oxide , opaque region of a mask or reticle , or in a photoresist layer .

氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。

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One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process .

一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；

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As the density of VLSI circuit increases , the proximity effect has been one of the critical issues in optical lithography .

随着超大规模集成电路（VLSI ）图形密度的增大，临近效应已成为光学光刻的关键问题之一。

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A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus .

为移动一个基板相对于一个光刻设备基板表基板处理程序。

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Contact-mode photolithography was used for realizing the monolithic integration of 0 .

采用光学接触式光刻方式，实现了单片集成 0 。

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Alignment Precision - Displacement of patterns that occurs during the photolithography process .

套准精度 -在光刻工艺中转移图形的精度。

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A novel method for measuring dense-line depth of focus (DOF) of a lithographic projection system is proposed .

提出了一种检测光刻机投影物镜密集线焦深（DOF ）的新技术。

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Sanlian lithography alone would have been encoded with the new factory bike to the various stores , so stores have not a single triple .

三联单光刻本来编码自行车新厂的各种品牌专卖店，商店还没有一个单一的三倍。

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Experimental results of deep submicron lithography with a excimer laser are reported in this paper.

报道用远紫外准分子激光进行亚微米光刻的实验结果。

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During the retention phase , the Clear Aligner acts as a passive retainer but it is activated if relapse occurs .

在保留期，明确光刻作为被动聘但它已被激活，如果出现复发。

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The invention also relates to a method for lithographically producing a hologram in a storage medium .

本发明还涉及一种在存储媒体中制作全息图的光刻方法。

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aqueous solution as the developer the photoresist can be of negative tone .

用氢氧化钠 -乙醇水溶液显影可以得到负性光刻图形；

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The smallest linewidth produced by laser lithography plays an important role in the properties of the micro-optical elements .

光刻的最细线宽对所加工的二元微器件性能起决定作用。

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DPT is a promising technique that bridges the anticipated technology gap for next nodes by utilizing current tools without changing much .

双重图形技术只需对现有光刻基础设施进行很小的改动，就可以有效填补更小节点的光刻技术空白。

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Nikon and rival ASML Holding NV are going toe-to-toe in lithography , but the two the companies have markedly different strategies .

尼康和 ASML 在高端光刻机领域是一对死对头，不过两家公司的 EUV 战略有着显著的不同之处。

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